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Introduction to the
Phosphorus doped latex source new material products, is designed for the diode manufacturing and the development of innovative inventions, mainly used in semiconductor chip diffusion of new materials: won the 16th Chinese scientists forum 2019 China Science and Technology Innovation and Invention Achievement Award, won the 2019(the fifth) Hua ZunAward China business ten industries innovative enterprises:In June 2020, it was authorized by the State Intellectual Property Office for invention patent.
Applications: Diffusion doping sources for semiconductor chips.
Quality effect: the new material of phosphor-doped latex source has been used by customers for more than ten years, and the user reflects the good effect. The diffusion coefficient is relatively concentrated, the chip junction depth is uniform, the phosphorus flower is fine, the silicon wafer surface is clean, the silicon lattice is uniform in thickness, and there is no alloy point.After diffusion, the device surface is clean and dry, which will not damage the silicon surface and is conducive to lithography.
Advantages: simple equipment, few procedures, one step process can be completed diffusion, source concentration can be adjusted in a larger range, the basic non-toxic impurities precipitation, etc., than the current commonly used liquid source, solid source has more advantages, basically non-toxic odorless more environmental protection, than the conventional process is simpler, stable, reliable, safe;At the same time, the diffusion is not affected by airflow. In the same furnace, not only the uniformity of the same large plate is good, but also the uniformity between the plates is good, and the reproducibility of the results is also quite good.
Operation process:
1. Coating method coating source: the use of central rotation coater.Start the motor to start the coating machine, so that the silicon wafer adhesive adsorption plate high-speed rotation, speed of about 3000-4000 RPM, the clean silicon wafer on the adhesive adsorption plate, with vacuum adsorption method to absorb the wafer, with a brush the source coated on the silicon wafer, so that the source is full of the whole silicon wafer.Be careful when coating source: shake the source evenly before use
(when not used to use plastic wrap to seal the storage freezer), the source should be evenly covered with the whole surface of the silicon wafer, the source of the glue plate rotation to be stable, not eccentric.The amount of coating source, the rotation speed of the coating plate, the coating time and so on all have an impact on the thickness of the source film.In order to ensure the consistency of product parameters, it is necessary to strictly grasp the conditions of the coating source, if the conditions are available, the operator had better be fixed;The whole TuYuan
The process must be carried out in a purified environment and the relative humidity must be less than 40%.
2. Pre-drying: the purpose is to remove the excessive solvent in the latex film and increase the adhesion between the film and the silicon wafer.Pre-drying temperature is about 200°C.Put the quartz boat into the diffuse quartz tube mouth where the temperature has risen to the desired value, for about 30 minutes.
3 diffusion: after pre-drying, the wafer can be pushed into the constant temperature area for diffusion, diffusion temperature and time phosphorus expansion →1220℃/ 3.5h (R coefficient between 0.19-0.20).
Precautions for use and storage:
1, away from fire, heat source.The packing must be sealed and protected from moisture.Should be stored separately from flammable, combustible, alkali, etc.Prevent damage to packaging and containers.It is not suitable for transportation in rainy weather.
2. Pour as much as you use.Because the source is volatile, to quickly smear, the original bottle cap cover.
3, the phosphorus source should be put in the refrigerator of 2~5 degrees, do not be reliable refrigerator wall.
4. Pay attention to hand protection when using this product: wear anti-poison penetration gloves.
4. Pay attention to hand protection when using this product: wear anti-poison penetration gloves.
Shelf life: 60 days
Packing: carton with built-in foam box, 10 bottles per carton (10L), plastic bottle: 1L pure liquid
Certificate of invention patent: Certificate No. 3850860 Product patent No. : ZL 2018 L 0555900.0
Market Feedback: Comparison of data feedback from the testing report of the user
Domestic phosphorus paper
Diffusion source name standard diffusion condition results
The block coefficient after phosphorus diffusion was 0.17±0.05 1240℃.5H 0.201-0.212
The phosphorus surface coefficient after boron diffusion is 0.085±0.01 1263.29h 0.095-0.112
Phosphorus paper is imported from USA
Diffusion source name standard diffusion condition results
The block coefficient after phosphorus diffusion was 0.185±0.005 at 1200℃.6H was 0.181-0.192
The phosphorus surface coefficient after boron diffusion is 0.080±0.01 1260℃.46H 0.078-0.084
Phosphorus - doped latex source
Diffusion source name standard diffusion condition results
The block coefficient after phosphorus diffusion was 0.185±0.005 at 1200℃.6H was 0.181-0.195
The phosphorus surface coefficient after boron diffusion is 0.080±0.01 1260℃.46H 0.078-0.084
GPP point yield 99.3%, packaging electrical :VB ≥1100V, VF:≤0.98V, TRR:≥ 1000NS
In summary, the comparison of the feedback data proves that the quality of the phosphor-doped latex source is not significantly different from that of the phosphorus paper imported from the United States, and it is better than that of the domestic phosphorus paper.As a new diffusion material of semiconductor chips, phosphorous doped latex source has been gradually paid attention to and accepted by manufacturers, and has been popularized and applied.
Price advantage:
After accounting: the use of phosphor-doped latex source (semiconductor chip diffusion) new material, each piece of silicon wafer coating source cost is about 0.1~0.2 yuan, and the use of phosphorus paper imported from the United States as the diffusion material, each piece of silicon wafer coating source cost is 2-3 yuan or even higher;The use of domestic phosphorus paper as a diffusion material, each piece of silicon wafer coating source cost between 1-2 yuan;By comparing the use of phosphorus-doped latex source as the diffusion material, the price advantage is extremely obvious and the production cost is greatly reduced.This product has been accepted by more and more enterprises.
Current customer distribution: Jiangsu, Zhejiang, Shandong, Sichuan
Phosphorus - doped latex source
Metal ion detection data
Heavy metals (in Pb)
Copper or less...0.0001%
Iron or less...0.0001%
Nickel or less...0.0005%.
Chromium or less....0.0004%
Arsenic or less....0.009%
Water or less....0.06%
Phosphorus - doped latex source manual
Product name: P227 phosphorus - doped latex source
Alias: Phosphorus source, latex source
Properties: Colorless transparent liquid, slightly odour.Irritant, corrosive, flammable.
Main raw material: ethyl silicate phosphorus pentoxide
Packing method: 1000ML plastic bottle with thread mouth
Validity: 60 days (2~5 degrees in refrigerator)
Recommended applications: semiconductor diodes, silicon wafers, solar chip phosphorus diffusion applications.
Restricted use: not for medicinal, food, household or other purposes.
Manufacturer: Shanghai Meishu Chemicals Co., Ltd
Address: Room 1301, No. 1085, Zhenchen Road, Shanghai
matters need attention; matters needing attention;...
Hazard information: flammable, corrosive liquids
Precautions: Keep away from sparks and open flames. No fireworks
emergency treatment; first aid measures; first aid...
Skin contact: wipe the poison with soft paper or cotton as soon as possible, rinse the skin thoroughly with soapy water and water or soak with 3% sodium bicarbonate solution.Then rinse thoroughly with water.If you feel unwell, seek medical advice.
Eye contact: wipe the poison with soft paper or cotton as soon as possible, separate the eyelids, and rinse with running water or normal saline.If you feel unwell, seek medical advice.
Inhalation: leave the scene quickly to fresh air.Give artificial respiration when necessary.Go to a doctor.If breathing is difficult, give oxygen.Do not use mouth-to-mouth resuscitation if the patient ingested or inhaled the substance. Use a one-way valve respirator or other appropriate medical respirator.
Ingestion: take by mistake immediately gargle, to drink milk or egg white.Do not induce vomiting.If you feel unwell, seek medical advice.
fire protection
Fire extinguishing method: sand soil, dry powder.Foam or carbon dioxide extinguishing agent.No water.If the substance or contaminated fluid enters the waterway, notify downstream users with potential water contamination and notify local health and fire officials and pollution control departments.
Avoid using direct running water to extinguish the fire. Direct running water may cause flammable liquid to splash and spread the fire.Eliminate all ignition sources
Fire fighting precautions and protective measures:
Fire personnel should wear full - body fire fighting clothing, wearing air - carrying breathing apparatus, in the upwind.
Isolate the accident site and prohibit the entry of irrelevant personnel.Receive and dispose fire water to prevent environmental pollution.
Emergency treatment of leakage
Isolate the leakage contaminated area, set warning signs around, do not contact the leakage directly, do not make the leakage and combustible substances (wood, paper, oil, etc.) contact, do not spray water directly to the leakage, do not let the water into the packaging container.Carefully sweep up, add a small amount of water to a large amount, adjust to neutral, then put into the wastewater system.If there is a large leak, remove it under the guidance of a technician.
Do not touch or cross the spill.
All equipment used in the operation should be connected to the ground.
Cut off the source of leakage as much as possible.
Environmental protection measures: take in the leakage to avoid polluting the environment.Prevent leaks from entering sewers, surface water and groundwater.Reception, removal method and disposal materials used for leaking chemicals: small leakage: collect the leaking liquid in airtight containers as far as possible.Absorbed with sand, activated carbon or other inert materials and transferred to a safe place.Do not flush down the drain.
Precautions for use and storage:
1, away from fire, heat source.The packing must be sealed and protected from moisture.Should be stored separately from flammable, combustible, alkali, etc.Prevent damage to packaging and containers.It is not suitable for transportation in rainy weather.
2. Pour as much as you use.Because the source is volatile, to quickly smear, the original bottle cap cover.
3, the phosphorus source should be put in the refrigerator of 2~5 degrees, do not be reliable refrigerator wall.
4. Pay attention to hand protection when using this product: wear anti-poison penetration gloves.
